机译:在Si基板上制备具有AlN / GaN缓冲层的GaN基UV光电二极管的低频噪声特性
Institute of Microelectronics & Department of Electrical Engineering, Center for Micro/Nano Science and Technology, Advanced Optoelectronic Technology Center, National Cheng Kung University, Tainan 70101. Taiwan;
Institute of Microelectronics & Department of Electrical Engineering, Center for Micro/Nano Science and Technology, Advanced Optoelectronic Technology Center, National Cheng Kung University, Tainan 70101. Taiwan Institute of Nanotechnology and Microsystems Engineering, National Cheng Kung University, Tainan 70101, Taiwan Institute of Microelectronics & Department of Electrical Engineering, Center for Micro/Nano Science and Technology, Advanced Optoelectronic Technology Center, National Cheng Kung University, Tainan 70101;
Institute of Microelectronics & Department of Electrical Engineering, Center for Micro/Nano Science and Technology, Advanced Optoelectronic Technology Center, National Cheng Kung University, Tainan 70101. Taiwan;
Deportments of Electronic Engineering, Southern Taiwan University of Technology, Tainan 710, Taiwan;
Institute of Microelectronics & Department of Electrical Engineering, Center for Micro/Nano Science and Technology, Advanced Optoelectronic Technology Center, National Cheng Kung University, Tainan 70101. Taiwan;
Institute of Nanotechnology and Microsystems Engineering, National Cheng Kung University, Tainan 70101, Taiwan;
B3. MSM; B3. Photodetectors; B2. Si substrates; B3. Noise; B3. NEP;
机译:具有AlN缓冲层的硅衬底上的GaN紫外光二极管
机译:通过掠角沉积制备的锯齿形和螺旋铝层及其在gan基发光二极管中作为缓冲层的应用
机译:通过瞥见角度沉积及其应用作为GaN的发光二极管中的缓冲层制备的Zigzag和螺旋Aln层
机译:使用双缓冲层结构制造的GaN基可见光UV检测器的低频噪声表征
机译:晶格匹配InxAl 1-xN与GaN的Vegard定律的验证以及用于深紫外LED的AlxGa1-xN / AlN的MOCVD生长
机译:蓝宝石衬底上具有反应性等离子体沉积AlN成核层的GaN基紫外发光二极管的效率提高
机译:使用双缓冲层结构制造的GaN基可见光UV检测器的低频噪声表征