The impact of an intermediate temperature buffer on the growth of GaN on an AlN template by hydride vapor phase epitaxy

摘要

The present study focused on the effect of an intermediate-temperature (IT; ～900℃) buffer layer on GaN films, grown on an AIN/sapphire template by hydride vapor phase epitaxy (HVPE). In this paper, the surface morphology, structural quality, residual strain, and luminescence properties are discussed in terms of the effect of the buffer layer. The GaN film with an IT-buffer revealed a relatively lower screw-dislocation density (3.29 × 10~7 cm~(-2)) and a higher edge-dislocation density (8.157 × 10~9 cm~(-2)) than the GaN film without an IT-buffer. Moreover, the IT-buffer reduced the residual strain and improved the luminescence. We found that the IT-buffer played an important role in the reduction of residual strain and screw-dislocation density in the overgrown layer through the generation of edge-type dislocations and the spontaneous treatment of the threading dislocation by interrupting the growth and increasing the temperature.