首页> 外文期刊>Journal of Crystal Growth >Three-dimensional calculations of facets during Czochralski crystal growth
【24h】

Three-dimensional calculations of facets during Czochralski crystal growth

机译:直拉晶体生长过程中小平面的三维计算

获取原文
获取原文并翻译 | 示例
       

摘要

Facets occur in bulk crystal growth of oxides and also in those of semiconductors. They are the origin of many problems during growth, like e.g. twinning, oscillating menisci, constitutional undercooling, spiral growth. It is still a challenge to understand the mechanisms in the non-linear coupling of faceted growth, melt flow, and radiation. In Czochralski growth computations have to be fully 3D because the shape of the crystal is no longer axi-symmetric when side facets appear.rnIn this paper we introduce a numerical approach for a 3D computing of fluid flow, thermal transport and faceted growth in a Czochralski environment. The numerical algorithm is based on lattice Boltzmann methods for thermal and velocity fields calculations while interface motion is calculated by directly applying an interface motion operator at each interface node-point. The results show that the macroscopic shape of the interface and the crystal shape are significantly affected by facets.
机译:氧化物和半导体的块状晶体生长中都存在刻面。它们是成长过程中许多问题的根源,例如孪生,半月形振荡,结构性过冷,螺旋形增长。理解刻面生长,熔体流动和辐射的非线性耦合机制仍然是一个挑战。在Czochralski中,生长计算必须是完全3D的,因为当出现侧面时晶体的形状不再是轴对称的.rn本文中我们引入了一种数值方法来对Czochralski中的流体流动,热传递和面生长进行3D计算环境。数值算法基于晶格Boltzmann方法进行热场和速度场计算,而界面运动是通过直接在每个界面节点处应用界面运动算符来计算的。结果表明,界面的宏观形状和晶体形状受刻面的影响很大。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号