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Selective MOVPE growth of InAs QDs using double-cap procedure

机译:使用双帽法对InAs QD进行选择性MOVPE生长

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Broadband spectrum emission was obtained for self-assembled Stranski-Krastanov (S-K) InAs/InP quantum dots (QDs) grown by selective area low pressure metalorganic vapor phase epitaxy (MOVPE) using the double-cap procedure. Selective area growth using a SiO_2 narrow stripe mask array pattern was carried out to control and widen the emission wavelength range of the QDs in 16 stripe mask array waveguides. The height of the QDs in the multi stacked QD layers was changed using the double-cap procedure, and the strain was controlled by changing the composition of the GalnAs buffer layer under the QDs, which resulted in the broadband spectrum emission of this structure.
机译:使用双帽法通过选择性区域低压金属有机气相外延(MOVPE)生长的自组装Stranski-Krastanov(S-K)InAs / InP量子点(QD)获得了宽带光谱发射。进行了使用SiO_2窄条纹掩模阵列图案的选择性区域生长,以控制和加宽16条条纹掩模阵列波导中QD的发射波长范围。使用双帽程序更改了多个堆叠QD层中QD的高度,并通过更改QD下的GalnAs缓冲层的成分来控制应变,从而导致了该结构的宽带光谱发射。

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