机译:使用双帽法对InAs QD进行选择性MOVPE生长
Department of Engineering and Applied Sciences, Sophia University, 7-1 Kioi-cho, Chiyoda-ku, Tokyo 102-8554, Japan;
Department of Engineering and Applied Sciences, Sophia University, 7-1 Kioi-cho, Chiyoda-ku, Tokyo 102-8554, Japan;
Department of Engineering and Applied Sciences, Sophia University, 7-1 Kioi-cho, Chiyoda-ku, Tokyo 102-8554, Japan;
Department of Engineering and Applied Sciences, Sophia University, 7-1 Kioi-cho, Chiyoda-ku, Tokyo 102-8554, Japan;
A3. Metalorganic vapor phase epitaxy; A3. Quantum wells; A3. Selective epitaxy; B2. Semiconducting Ⅲ-Ⅴ materials; B2. Semiconducting indium phosphide;
机译:采用Movpe选择性区域生长的双帽法从Inas / inp Qds进行宽带波长电致发光
机译:Gasxin_(1-x)作为盖层的Inas / inp Qds,采用Movpe选择性区域生长的双帽工艺
机译:通过使用MOVPE选择性区域生长的双封顶工艺生长的宽发射波长InAs / InP量子点
机译:使用选择性MOVPE生长和双电容工艺的InAs / InP QD宽带LED
机译:MOVPE生长的氮化镓基同轴LED的生长,加工和表征
机译:预构造GaAs表面用于随后的位置选择性InAs量子点生长的研究
机译:在不使用应变平衡技术的情况下提高通过MOVPE生长的InAs / GaAs QD阵列的太阳能电池的量子效率