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机译:通过低压MOCVD在γ-LiA1O_2(3 0 2)衬底上生长的非极性a面GaN膜
Key Laboratory of Materials Science and Technology for High Power Laser, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, P.O. Box 800-211, Shanghai 201800, China Graduate School of Chinese Academy of Sciences, Beijing 100049, China;
Key Laboratory of Materials Science and Technology for High Power Laser, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, P.O. Box 800-211, Shanghai 201800, China;
Key Laboratory of Materials Science and Technology for High Power Laser, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, P.O. Box 800-211, Shanghai 201800, China Graduate School of Chinese Academy of Sciences, Beijing 100049, China;
Key Laboratory of Materials Science and Technology for High Power Laser, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, P.O. Box 800-211, Shanghai 201800, China Graduate School of Chinese Academy of Sciences, Beijing 100049, China;
Key Laboratory of Materials Science and Technology for High Power Laser, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, P.O. Box 800-211, Shanghai 201800, China Graduate School of Chinese Academy of Sciences, Beijing 100049, China;
Key Laboratory of Materials Science and Technology for High Power Laser, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, P.O. Box 800-211, Shanghai 201800, China Graduate School of Chinese Academy of Sciences, Beijing 100049, China;
Key Laboratory of Materials Science and Technology for High Power Laser, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, P.O. Box 800-211, Shanghai 201800, China Graduate School of Chinese Academy of Sciences, Beijing 100049, China;
Key Laboratory of Materials Science and Technology for High Power Laser, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, P.O. Box 800-211, Shanghai 201800, China;
Graduate School of Chinese Academy of Sciences, Beijing 100049, China Suzhou Institute of Nano-tech and Nanobionics, Chinese Academy of Sciences, Suzhou 215123, China;
Graduate School of Chinese Academy of Sciences, Beijing 100049, China Suzhou Institute of Nano-tech and Nanobionics, Chinese Academy of Sciences, Suzhou 215123, China;
Suzhou Institute of Nano-tech and Nanobionics, Chinese Academy of Sciences, Suzhou 215123, China;
Graduate School of Chinese Academy of Sciences, Beijing 100049, China Suzhou Institute of Nano-tech and Nanobionics, Chinese Academy of Sciences, Suzhou 215123, China;
Suzhou Institute of Nano-tech and Nanobionics, Chinese Academy of Sciences, Suzhou 215123, China;
Suzhou Institute of Nano-tech and Nanobionics, Chinese Academy of Sciences, Suzhou 215123, China;
A1. High resolution X-ray diffraction; A1. Scanning electron microscope; A3. Metal-organic chemical vapor; deposition; B1. GaN; B1. UAlO_2;
机译:通过MOCVD在r面蓝宝石衬底上生长的非极性a面GaN薄膜的偏振拉曼散射研究
机译:MOCVD法在r面蓝宝石衬底上生长的非极性a面p型GaN层的最佳活化条件
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机译:MOCVD在r面蓝宝石衬底上生长的a面GaN膜上AlGaN缓冲层中Al组成的影响
机译:通过低压MOCVD生长的III型氮化物半导体膜和器件结构。
机译:在a平面和m平面GaN衬底上生长的InGaN / GaN多量子阱的光学和偏振特性的研究
机译:通过低压MOCVD在γ-LiAlO2(3 0 2)衬底上生长的非极性a面GaN膜