机译:GaN模板对通过有机金属化学气相沉积(MOCVD)在铟非常富集的条件下生长到AlInN外延层中的意想不到的Ga原子的贡献
State Key Laboratory on Integrated Photoelectronics, Institute of Semiconductors, Chinese Academy of Sciences, P.O. Box 912, Beijing 100083, China,Key Laboratory of Nanodevices and Applications, Suzhou Institute of Nano-tech and Nano-bionics, Chinese Academy of Sciences, 398 Ruoshui Road, Suzhou, Jiangsu 215123, P. R. China;
Key Laboratory of Nanodevices and Applications, Suzhou Institute of Nano-tech and Nano-bionics, Chinese Academy of Sciences, 398 Ruoshui Road, Suzhou, Jiangsu 215123, P. R. China;
Key Laboratory of Nanodevices and Applications, Suzhou Institute of Nano-tech and Nano-bionics, Chinese Academy of Sciences, 398 Ruoshui Road, Suzhou, Jiangsu 215123, P. R. China,School of Material Science and Engineering, Hebei University of Technology, Tianjin 300130, China;
State Key Laboratory on Integrated Photoelectronics, Institute of Semiconductors, Chinese Academy of Sciences, P.O. Box 912, Beijing 100083, China;
State Key Laboratory on Integrated Photoelectronics, Institute of Semiconductors, Chinese Academy of Sciences, P.O. Box 912, Beijing 100083, China,Key Laboratory of Nanodevices and Applications, Suzhou Institute of Nano-tech and Nano-bionics, Chinese Academy of Sciences, 398 Ruoshui Road, Suzhou, Jiangsu 215123, P. R. China;
State Key Laboratory on Integrated Photoelectronics, Institute of Semiconductors, Chinese Academy of Sciences, P.O. Box 912, Beijing 100083, China;
State Key Laboratory on Integrated Photoelectronics, Institute of Semiconductors, Chinese Academy of Sciences, P.O. Box 912, Beijing 100083, China;
State Key Laboratory on Integrated Photoelectronics, Institute of Semiconductors, Chinese Academy of Sciences, P.O. Box 912, Beijing 100083, China;
State Key Laboratory on Integrated Photoelectronics, Institute of Semiconductors, Chinese Academy of Sciences, P.O. Box 912, Beijing 100083, China,Key Laboratory of Nanodevices and Applications, Suzhou Institute of Nano-tech and Nano-bionics, Chinese Academy of Sciences, 398 Ruoshui Road, Suzhou, Jiangsu 215123, P. R. China;
School of Material Science and Engineering, Hebei University of Technology, Tianjin 300130, China;
Key Laboratory of Nanodevices and Applications, Suzhou Institute of Nano-tech and Nano-bionics, Chinese Academy of Sciences, 398 Ruoshui Road, Suzhou, Jiangsu 215123, P. R. China;
Key Laboratory of Nanodevices and Applications, Suzhou Institute of Nano-tech and Nano-bionics, Chinese Academy of Sciences, 398 Ruoshui Road, Suzhou, Jiangsu 215123, P. R. China;
A1. Diffusion; A3. Metalorganic chemical vapor deposition; B1. Nitrides; B2. Semiconducting quaternary alloys;
机译:金属有机化学气相沉积在GaN外延层上生长的富GaN薄GaNP层的V形缺陷和光致发光的研究
机译:金属有机化学气相沉积和脉冲激光沉积生长的GaN外延层的光学研究
机译:我们在Si底物上报告了常常数-FaN基的异质结场效应晶体管(HFET)。使用金属化学气相沉积(MOCVD)生长AlGaN / AIN / GaN异质结构。用于常关操作的HFET W.
机译:金属化学气相沉积种植的氮化镓外膜中的极性控制
机译:金属有机化学气相沉积生长基于ZnGa2O4外延层的NO气体传感器
机译:GaN模板对通过有机金属化学气相沉积(MOCVD)在铟非常富集的条件下生长到AlInN外延层中的意想不到的Ga原子的贡献
机译:通过mOCVD(金属有机化学气相沉积)生长的高(Tc)超导薄膜的研究:进展报告,1986年7月1日 - 1989年9月30日。