首页> 外文期刊>Journal of Crystal Growth >Nucleation and phase formation during reactive magnetron co-sputtering of Cu(In,Ga)S_2 films, investigated by in situ EDXRD
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Nucleation and phase formation during reactive magnetron co-sputtering of Cu(In,Ga)S_2 films, investigated by in situ EDXRD

机译:原位EDXRD研究Cu(In,Ga)S_2薄膜在反应磁控共溅射过程中的形核和相形成

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摘要

Energy dispersive X-ray diffraction (EDXRD) has been used to observe in situ the formation of Cu(In,Ga)S_2 (CIGS) films during reactive magnetron co-sputtering. By simultaneous sputtering from a CuGa and an In target in an Ar:H_2S atmosphere the CIGS films, which can be used as absorber layers for thin film solar cells, can be grown in a single step without any post-treatments. By carefully analyzing the in situ experiments, several effects have been found which should be considered during designing the recipe for an absorber deposition process in order to achieve CIGS films with the desired stoichiometry and good crystallinity. For instance substrate temperatures below 380 ℃ should be used in order to achieve a sufficient condensation of In atoms which is needed to avoid the formation of intermetallic Cu-Ga phases. Since, on the other hand, high substrate temperatures are necessary in order to grow large crystallites, a process which starts at a low temperature and has temperature ramp up later on is possible because In which is bound in the chalcopyrite phase evaporates only for much higher temperatures. These results demonstrate the opportunities of EDXRD for the real-time analysis of the growth process of thin films which can provide information not obtainable by any ex situ characterization method.
机译:能量色散X射线衍射(EDXRD)已被用于在反应磁控共溅射过程中原位观察Cu(In,Ga)S_2(CIGS)薄膜的形成。通过在Ar:H_2S气氛中同时溅射CuGa和In靶,可以在没有任何后处理的情况下一步生长CIGS膜,该膜可用作薄膜太阳能电池的吸收层。通过仔细分析原位实验,发现了一些效果,在设计吸收体沉积工艺的配方时应考虑这些效果,以实现具有所需化学计量和良好结晶度的CIGS膜。例如,应使用低于380℃的衬底温度,以实现In原子的充分凝聚,这是避免形成金属间Cu-Ga相所必需的。另一方面,由于为了生长大的微晶需要高的衬底温度,所以可能在低温下开始并且随后温度升高的过程是可能的,因为结合在黄铜矿相中的In仅在更高的温度下蒸发。温度。这些结果证明了EDXRD可以实时分析薄膜的生长过程,从而可以提供任何非原位表征方法都无法获得的信息。

著录项

  • 来源
    《Journal of Crystal Growth》 |2013年第1期|114-121|共8页
  • 作者单位

    Helmholtz-Zentrum Berlin fuer Materialien und Energie GmbH, Department of Solar Fuels, Hahn-Meitner-Platz 1, 14109 Berlin, Germany;

    Helmholtz-Zentrum Berlin fuer Materialien und Energie GmbH, Department of Solar Fuels, Hahn-Meitner-Platz 1, 14109 Berlin, Germany;

    Helmholtz-Zentrum Berlin fuer Materialien und Energie GmbH, Department of Solar Fuels, Hahn-Meitner-Platz 1, 14109 Berlin, Germany;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    A1 Energy dispersive X-ray diffraction; A3 Reactive magnetron sputtering; B1 Cu(In,Ga)S_2; B3 Thin film solar cells;

    机译:A1能量色散X射线衍射;A3反应磁控溅射;B1 Cu(In;Ga)S_2;B3薄膜太阳能电池;

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