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Uncooled InGaSb photovoltaic infrared detectors for gas sensing

机译:用于气体传感的非冷却InGaSb光电红外探测器

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摘要

We developed a mid-infrared InGaSb-based photovoltaic infrared sensor (InCaSb PVS) for gas sensing, with improved performance at room temperature, when compared with previous InSb-based PVS. To improve the performance at absorbance wavelengths of most important gases, such as CO_2, InGaSb was employed in the light absorber layer. High quality InGaSb films were obtained with the introduction of an InSb buffer layer, directly grown on GaAs substrate. As a result, the signal-to-noise ratio (SNR) of the InGaSb PVS was 1.3 times higher than the previous InSb PVS at a wavelength of 4.2 μm, were CO_2 absorption occurs.
机译:与以前的基于InSb的PVS相比,我们开发了一种基于InGaSb的中红外光电红外传感器(InCaSb PVS),在室温下具有更高的性能。为了提高大多数重要气体(例如CO_2)在吸收波长处的性能,在光吸收层中采用了InGaSb。通过引入直接生长在GaAs衬底上的InSb缓冲层,可以获得高质量的InGaSb膜。结果,在发生CO_2吸收的情况下,InGaSb PVS的信噪比(SNR)在4.2μm的波长下比以前的InSb PVS高1.3倍。

著录项

  • 来源
    《Journal of Crystal Growth》 |2013年第1期|611-613|共3页
  • 作者单位

    Compound Semiconductor Development Department, R&D Center, Asahi Kasei Microdevices Corporation, 2-1 Samejima, Fuji, Shizuoka 416-8501, Japan;

    Compound Semiconductor Development Department, R&D Center, Asahi Kasei Microdevices Corporation, 2-1 Samejima, Fuji, Shizuoka 416-8501, Japan;

    Compound Semiconductor Development Department, R&D Center, Asahi Kasei Microdevices Corporation, 2-1 Samejima, Fuji, Shizuoka 416-8501, Japan;

    Compound Semiconductor Development Department, R&D Center, Asahi Kasei Microdevices Corporation, 2-1 Samejima, Fuji, Shizuoka 416-8501, Japan;

    Compound Semiconductor Development Department, R&D Center, Asahi Kasei Microdevices Corporation, 2-1 Samejima, Fuji, Shizuoka 416-8501, Japan;

    Compound Semiconductor Development Department, R&D Center, Asahi Kasei Microdevices Corporation, 2-1 Samejima, Fuji, Shizuoka 416-8501, Japan;

    Compound Semiconductor Development Department, R&D Center, Asahi Kasei Microdevices Corporation, 2-1 Samejima, Fuji, Shizuoka 416-8501, Japan;

    Compound Semiconductor Development Department, R&D Center, Asahi Kasei Microdevices Corporation, 2-1 Samejima, Fuji, Shizuoka 416-8501, Japan;

    Compound Semiconductor Development Department, R&D Center, Asahi Kasei Microdevices Corporation, 2-1 Samejima, Fuji, Shizuoka 416-8501, Japan;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    A3. Molecular beam epitaxy; B2. Semiconducting Ⅲ-Ⅴ materials; B3. Infrared devices;

    机译:A3。分子束外延;B2。半导体Ⅲ-Ⅴ材料;B3。红外线设备;

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