首页> 外文期刊>Journal of Crystal Growth >Growth and recrystallization of CeO_2 thin films deposited on R-plane sapphire by off-axis RF sputtering
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Growth and recrystallization of CeO_2 thin films deposited on R-plane sapphire by off-axis RF sputtering

机译:通过离轴RF溅射沉积在R面蓝宝石上的CeO_2薄膜的生长和重结晶

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摘要

The microstructure of ()1 0 0)-oriented epitaxial CeO_2 thin layers grown on R-plane sapphire (AL_@O_3) by off-axis RF sputtering was investigated. The crystalline perfection of CeO_2 layers was characgerized by Bragg-Brentano X-ray spectra, rocking curves (ω-scan) and TEM. The surface morphology was controlled by AFM. The as-deposited layers display smal size mosaicity (~ 20 nm), arcing 6-7 deg, and surface roughness ≈4 nm.
机译:研究了通过离轴RF溅射在R面蓝宝石(AL_ @ O_3)上生长的()1 0 0)取向外延CeO_2薄层的微观结构。 CeO_2层的结晶完善性通过Bragg-Brentano X射线光谱,摇摆曲线(ω-扫描)和TEM表征。通过AFM控制表面形态。沉积后的层显示出很小的镶嵌度(〜20 nm),弧度为6-7度,表面粗糙度约为4 nm。

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