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Photoluminescence from ZnO Thin Film deposited on R-Plane Sapphire Substrate by RF Magnetron Sputtering

机译:射频磁控溅射沉积在R型蓝宝石衬底上的ZnO薄膜的光致发光

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Photoluminescence from epitaxial ZnO thin films deposited on R-plane sapphire substrates by RF magnetron sputtering was investigated. The intensity of the near band emission (NBE) of the ZnO thin film on R-plane sapphire was stronger than that of the film formed on C-plane sapphire at a low temperature. Some experimental results suggest that NBE depends on the polarization of the excitation light, which are considered to be related to the ZnO crystal orientation on the sapphire substrate.
机译:研究了通过射频磁控溅射在R面蓝宝石衬底上沉积的外延ZnO薄膜的光致发光。在低温下,R面蓝宝石上的ZnO薄膜的近带发射(NBE)强度要强于C面蓝宝石上形成的膜的近带发射。一些实验结果表明,NBE取决于激发光的偏振,这被认为与蓝宝石衬底上ZnO晶体的取向有关。

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