首页> 外文期刊>Journal of Crystal Growth >Growth and layer structure optimization of 2.26 μm (A1GaIn)(AsSb) diode lasers for room temperature operation
【24h】

Growth and layer structure optimization of 2.26 μm (A1GaIn)(AsSb) diode lasers for room temperature operation

机译:用于室温操作的2.26μm(A1GaIn)(AsSb)二极管激光器的生长和层结构优化

获取原文
获取原文并翻译 | 示例
           

摘要

The optimization of MBE growth conditions and layer structures for room temperature operation of 2.26 μm A1GaAsSb/GaInAsSb laser structures is investigated. Index guided triple quantum well large optical cavity diode lasers With 64 μm×1000 蘭 cavities and high reflection/antireflection coated facets reveal a cw output power of 350 mW at T=280 K. An internal quantum efficiency ηi of 69/100, internal losses ai of 7.7 cm~-1 and a threshold current density for Infinite cavity length of j_∞=144 A/cm~2 are obtained for this structure.
机译:研究了室温下2.26μmAlGaAsSb / GaInAsSb激光结构MBE生长条件和层结构的优化。具有64μm×1000lan腔和高反射/抗反射涂层小面的折射率导向三量子阱大光腔二极管激光器在T = 280 K时显示cw输出功率为350 mW。内部量子效率ηi为69/100,内部对于这种结构,获得了7.7 cm-1的损耗ai,并且无限腔长度的阈值电流密度为j_∞= 144 A / cm〜2。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号