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首页> 外文期刊>Journal of Crystal Growth >GSMBE growth of InGaP/(In)GaAs modulation-doped heterostructures and their applications to HEMT and HHMT
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GSMBE growth of InGaP/(In)GaAs modulation-doped heterostructures and their applications to HEMT and HHMT

机译:InGaP /(In)GaAs调制掺杂异质结构的GSMBE生长及其在HEMT和HHMT中的应用

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摘要

In this paper we report for the first time gas-source molecular beam epitaxy of both n- and p-channel InGaP/ (In)GaAs modulation-doped heterostructure. The sheet density dependence of the two-dimensional hole gas (2DHG) mobility of p-type In_0.49Ga_0.51P/GaAs structures was investigated by Van der Paul Hall measurement at 300 and 77 K. The 2DHG densities of 2.78×10~12 and 1.02×10~12 cm~-2 with mobilities of 191 and 2831 cm~2/Vs at 300 and 77 K, Respectively, for In_0.49Ga_0.51P/GaAs structures have been achieved.
机译:在本文中,我们首次报道了n通道和p通道InGaP /(In)GaAs调制掺杂异质结构的气源分子束外延。 p型In_0.49Ga_0.51P / GaAs结构的二维空穴气(2DHG)迁移率的薄层密度依赖性通过Van der Paul Hall测量在300和77 K下进行了研究。2DHG密度为2.78×10〜12对于In_0.49Ga_0.51P / GaAs结构,分别在300 K和77 K下获得了1.02×10〜12 cm〜-2和191和2831 cm〜2 / Vs的迁移率。

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