首页> 外文期刊>Journal of Crystal Growth >Enchanced 1.3-μm-emission from InAs quantum dots embedded in symmetric (In,Ga)As quantum-well structures
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Enchanced 1.3-μm-emission from InAs quantum dots embedded in symmetric (In,Ga)As quantum-well structures

机译:嵌入对称(In,Ga)As量子阱结构中的InAs量子点的增强的1.3μm发射

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摘要

We have optically characterized the emission of a layer of InAs quantum dots embedded at the center of symmetric (In,Ga)As quantum-well structures. By grading the profile of the indium composition in the quantum-well regions in a certain way, it is found that the room-temperature emission of the dots can be enhanced by almost an order of magnitude compared to dots bounded by conventional (In,Ga)As quantum wells. The largest enhancement is obtained for structures where the grading is achieved by using a GaAs/InAs superlattice structure to form a quasi-linear distribution of the indium. The dots inside the graded quantum-well structures are engineered to emit at the important telecommunication wavelength of 1.3 μm.
机译:我们已光学表征了嵌入在对称(In,Ga)As量子阱结构中心的InAs量子点层的发射。通过以一定方式对铟组分在量子阱区域中的分布进行分级,发现与常规(In,Ga)包围的点相比,点的室温发射可以提高几乎一个数量级。作为量子阱。对于通过使用GaAs / InAs超晶格结构形成铟的准线性分布而实现渐变的结构,可以获得最大的增强。渐变量子阱结构内部的点经设计可在1.3μm的重要电信波长处发射。

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