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首页> 外文期刊>Journal of Computational Electronics >Performance optimization of MOS-like carbon nanotube-FETs based on electrostatic doping
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Performance optimization of MOS-like carbon nanotube-FETs based on electrostatic doping

机译:基于静电掺杂的类MOS碳纳米管FET的性能优化

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摘要

Due to carriers Band-To-Band-Tunneling (BTBT) through channel-source/drain contacts, Conventional MOS-like Carbon Nanotube Field Effect Transistors (C-CNFETs) suffer from ambipolar conductance, which deteriorates the device performance greatly. In order to reduce such ambipolar behavior, a novel device structure based on electrostatic doping is proposed. The Non-Equilibrium Green's Function (NEGF) formalism based simulation results show that, with proper choice of tuning voltage, such electrostatic doping strategy can not only reduce the ambipolar conductance but also improve the sub-threshold performance, which are both quite desirable in circuit design to reduce the system power and improve the frequency as well. Further study reveals that the performance of the proposed design depends highly on the choice of tuning voltage value, which should be paid with much attention to obtain a proper trade-off between power and speed in application.
机译:由于载流子通过沟道-源极/漏极触点进行带对隧道连接(BTBT),传统的MOS型碳纳米管场效应晶体管(C-CNFET)遭受双极性电导的困扰,这大大降低了器件性能。为了减少这种双极性行为,提出了一种基于静电掺杂的新型器件结构。基于非平衡格林函数(NEGF)形式化的仿真结果表明,通过适当选择调谐电压,这种静电掺杂策略不仅可以降低双极性电导,而且可以提高亚阈值性能,这在电路中都是非常理想的设计以降低系统功耗并提高频率。进一步的研究表明,所提出的设计的性能在很大程度上取决于调谐电压值的选择,在应用中要在功率和速度之间取得适当的折衷,应该特别注意这一点。

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