This study investigates the effects of different recipes and concentrations of surfactant on the texture and reflectance of a multi-crystalline silicon wafer surface. The morphology of the surface was examined and photographed using a field emission scanning electronic microscope. The reflectance of the surface was measured and analyzed using a self-designed optical system. The results of this study show that a higher hydrocarbon-surfactant (CH-surfactant) concentration in the etchant resulted in a slower reaction time. The optimum concentration of CH-surfactant was 1%. However, there were many white bubbles in the etching process. The optimum recipe for surfactant included fluoride 2% to diminish these bubbles. The reflectance was less than 22% in visible light. This cost effective acid chemical etching method is suitable for texturing silicon surfaces on 50ânm nanostructures. This is a critical criterion for determining the optimum recipe for surface texturing of acidic etching in solar cells.View full textDownload full textKeywordssolar cell, multi-crystalline silicon, acidic texturing, reflectanceRelated var addthis_config = { ui_cobrand: "Taylor & Francis Online", services_compact: "citeulike,netvibes,twitter,technorati,delicious,linkedin,facebook,stumbleupon,digg,google,more", pubid: "ra-4dff56cd6bb1830b" }; Add to shortlist Link Permalink http://dx.doi.org/10.1080/02533839.2012.625142
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