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首页> 外文期刊>Journal of Chemical Information and Computer Sciences >MOLECULAR TOPOLOGICAL INDEX AND ITS APPLICATION .4. RELATIONSHIPS WITH THE DIAMAGNETIC SUSCEPTIBILITIES OF ALKYL-IVA GROUP ORGANOMETALLIC HALIDES
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MOLECULAR TOPOLOGICAL INDEX AND ITS APPLICATION .4. RELATIONSHIPS WITH THE DIAMAGNETIC SUSCEPTIBILITIES OF ALKYL-IVA GROUP ORGANOMETALLIC HALIDES

机译:分子拓扑指数及其应用.4。与烷基-IVA基有机金属卤化物的磁化率的关系

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On the basis of four-energy-level model proposed previously, a new topological index H-1 was introduced in the paper to investigate the diamagnetic susceptibility of the organometallics for the first time, which is essentially a kind of edge-weighted one in terms of the graph theory. The indices H-1's of the alkyl-IVA group organometallic halides, including halogen-substituted methanes and enthanes along with those represented by (CH3)(4)-(n)MX(n) (n = 0-4; M = Si, Ge, Sn), were calculated accordingly. Good linear relations were found between the H-1's and the corresponding diamagnetic susceptibilities chi(M)'s for each series of compounds with similar graphic representations. Moreover, estimation of chi(M)'s was made as to the compounds whose values are not experimentally measured yet. [References: 21]
机译:在先前提出的四能级模型的基础上,本文首次引入了一种新的拓扑指数H-1,以研究有机金属的抗磁化率,从本质上讲,它是一种边缘加权的。图论。烷基-IVA基团有机金属卤化物的指数H-1,包括卤素取代的甲烷和乙烷以及(CH3)(4)-(n)MX(n)表示的那些(n = 0-4; M = Si ,据此计算。对于具有相似图形表示的各系列化合物,在H-1和相应的抗磁化率chi(M)之间发现了良好的线性关系。此外,对于尚未通过实验测量其值的化合物,进行了chi(M)估计。 [参考:21]

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