Frequency Plasma Application: A Reduced Pressure to the Formation of Stable Fullerene Nanostructures

摘要

The dependence of the effect of plasma-chemical processing of fullerenes on the weight content of the nanoparticles is not more than 100 nm. It is shown, that the optimal combination of parameter values of plasma treatment, allowing to obtain samples of Fullerenes C_(60) nanoparticles less than 100 nm at a weight content of 47-48%, the pressure is 45-57 Pa, the argon plasma gas flow 0,025-0,03 g / sec, power consumption 4,8-6,0 kW at the time plasma treatment 100 seconds.