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首页> 外文期刊>Journal of Applied Physics >Electron Diffraction Studies of the Epitaxy of Cu Single Crystals. I. Epitaxy of Evaporated Cu Films on Cu Crystals
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Electron Diffraction Studies of the Epitaxy of Cu Single Crystals. I. Epitaxy of Evaporated Cu Films on Cu Crystals

机译:Cu单晶外延的电子衍射研究。 I.铜晶体上蒸发的铜膜的外延

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摘要

The epitaxy of evaporated Cu films on Cu single crystals has been investigated in situ under high‐vacuum conditions with reflection HEED techniques. Spherically shaped Cu single crystals with high quality surfaces were used as substrates. The effects of condensation temperature and the annealing behavior were studied for the main low‐index planes. A completely developed twin orientation of the film was found in all cases. For films deposited at room temperature the diffraction diagrams additionally contained a complete set of double diffraction spots.
机译:利用反射HEED技术在高真空条件下原位研究了Cu单晶上蒸发的Cu膜的外延。具有高质量表面的球形Cu单晶被用作衬底。研究了主要低折射率平面的冷凝温度和退火行为的影响。在所有情况下都发现了薄膜的完全孪生取向。对于在室温下沉积的薄膜,衍射图还包含一套完整的双衍射点。

著录项

  • 来源
    《Journal of Applied Physics》 |1966年第10期|共4页
  • 作者

    Krause G. O.;

  • 作者单位

    Metallurgical Research Laboratories, Syracuse University, Syracuse, New York;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

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