...
首页> 外文期刊>Journal of Applied Physics >Diffusion of Lithium into Ge and Si
【24h】

Diffusion of Lithium into Ge and Si

机译:锂扩散到锗和硅中

获取原文
获取原文并翻译 | 示例

摘要

Lithium was diffused into Ge and Si at temperatures 300°-400°C and 400°-500°C, respectively. The diffusion was carried out in an inert gas atmosphere by decomposing LiAlH4. The concentration of Li impurities as a function of depth from the surface of the sample was determined by lapping down thin layers of the diffused part of the sample and measuring the conductance of each of these thin layers. An erfc was chosen to fit the experimentally measured concentration curve from which the diffusion constant D for each temperature of diffusion was determined. The following dependence of temperature was found: D=9.10×10-3exp(-13100/RT) for Ge, and D=2.65×10-3exp(-14500/RT) for Si, where D is measured in cm2/sec, T in °K, and R=1.98 cal/°K. The deviation in the experimental values of D was not more than ±10% for Ge and ±20% for Si.
机译:锂分别在300°-400°C和400°-500°C的温度下扩散到Ge和Si中。通过在惰性气体气氛中分解LiAlH 4进行扩散。通过研磨样品的扩散部分的薄层并测量每个薄层的电导来确定Li杂质的浓度与从样品表面开始的深度的关系。选择一个erfc来拟合实验测得的浓度曲线,由此确定每个扩散温度的扩散常数D。发现以下温度依赖性:Ge的D = 9.10×10-3exp(-13100 / RT),Si的D = 2.65×10-3exp(-14500 / RT),其中D的单位为cm2 / sec, T以°K为单位,R = 1.98 cal /°K。 D的实验值的偏差对于Ge不大于±10%,对于Si不大于±20%。

著录项

  • 来源
    《Journal of Applied Physics 》 |1966年第4期| 共4页
  • 作者

    Pratt B.; Friedman F.;

  • 作者单位

    Department of Physics, Technion, Israel Institute of Technology, Haifa, Israel;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号