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首页> 外文期刊>Journal of Applied Physics >Mass‐Spectrometric Study of Sputtering of Single Crystals of GaAs by Low‐Energy A Ions
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Mass‐Spectrometric Study of Sputtering of Single Crystals of GaAs by Low‐Energy A Ions

机译:低能A离子溅射GaAs单晶的质谱研究

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摘要

Single crystals of GaAs [(110), (111), and (1¯1¯1¯) faces] were sputtered by normally incident low‐energy (0–140 eV) argon ions in the source of a mass spectrometer. For each face, approximately 99.4% of the collected ions were neutral Ga and As atomic species; the balance were neutral GaAs molecules. No neutral Ga2, As2 or (GaAs)2 molecules, or negative Ga-, As-, or (GaAs)- ions, with the characteristics of sputtered particles, were detected. Sputtering ``yields'''' for the three faces were found to be: ``Y'''' (111) ≈ ``Y'''' (1¯1¯1¯) ≫ ``Y'''' (110).
机译:GaAs [(110),(111)和(1′1′1′)面]的单晶在质谱仪源中被垂直入射的低能(0–140 eV)氩离子溅射。对于每个面,大约99.4%的离子是中性的Ga和As原子;其余为中性的砷化镓分子。未检测到具有溅射粒子特征的中性Ga2,As2或(GaAs)2分子,或负Ga-,As-或(GaAs)-离子。发现三个面的溅射``屈服率''为:``Y''''(111)≈``Y''''(1́1́1́)≫``Y''' '(110)。

著录项

  • 来源
    《Journal of Applied Physics 》 |1967年第7期| 共5页
  • 作者单位

    University of Delaware, Newark, Delaware;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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