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Perturbations of Microwave Cavity Fields by Time‐Varying Xenon Laser Discharges

机译:随时间变化的氙激光放电对微波腔场的扰动

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摘要

The effects of a time‐varying complex dielectric constant upon the resonant characteristics of a cylindrical microwave cavity are presented. The cavity resonance equations are developed to consider the influence of small periodic changes in resonant frequency, bandwidth, and cavity‐coupling coefficient upon the microwave power density within the cavity as a function of the probing microwave frequency. Expressions are derived which enable the separate contributions of periodic changes in cavity power density to be extracted from measurements at several microwave frequencies. It is shown that for high‐Q cavities, variations in the sampled microwave cavity fields are due predominantly to shifts in the cavity resonant frequency. By repetitively interrupting the mirror cavity of a 3.51‐μ xenon laser with a mechanical chopping wheel, very small periodic changes are induced in the electron density and collision frequency of the xenon dc discharge due to changes in the laser field strength. The resultant changes in microwave power level within a cylindrical cavity enclosing the discharge are measured as a function of probing frequency and compared with theoretical values, yielding excellent agreement for high‐Q cavity conditions. Where cavity loading severely degrades the Q, good agreement is obtained within the cavity half‐power frequencies. A microwave‐frequency compensation technique is employed which permits accurate direct measurement of small electron‐number density changes (Δnee∼3×10‐5) along the discharge‐tube length.
机译:提出了时变复介电常数对圆柱形微波腔共振特性的影响。腔共振方程的开发考虑了共振频率,带宽和腔耦合系数的微小周期性变化对腔内微波功率密度的影响,而微波功率密度是探测微波频率的函数。得出的表达式使腔体功率密度的周期性变化的单独贡献能够从几个微波频率下的测量值中提取出来。结果表明,对于高Q腔,采样的微波腔场中的变化主要归因于腔谐振频率的偏移。通过用机械斩波轮反复打断3.51-μ氙气激光器的镜腔,由于激光场强度的变化,氙气直流放电的电子密度和碰撞频率会产生非常小的周期性变化。测量了围绕放电的圆柱形空腔内的微波功率水平的最终变化,该变化是探测频率的函数,并与理论值进行了比较,从而在高Q空腔条件下具有极好的一致性。在腔负载严重降低Q的情况下,在腔半功率频率内可获得良好的一致性。采用微波频率补偿技术,可以精确地直接测量沿放电管长度的小电子数密度变化(Δne/ ne〜3×10-5)。

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  • 来源
    《Journal of Applied Physics》 |1968年第3期|共7页
  • 作者

    Weaver L. A.; Freiberg R. J.;

  • 作者单位

    University of Illinois, Gaseous Electronics Laboratory, Urbana, Illinois;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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