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Effects of Contact Placement and Sample Shape in the Measurement of Electrical Resistivity

机译:接触位置和样品形状对电阻率测量的影响

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摘要

The resistivity of a sample is given by ρ=VI-12πsF, where V is the voltage, I is the current, s is the voltage contact separation, and F is a correction factor appropriate to the sample geometry. Correction factors are found for the cases of parallelepiped samples with (1) nonequidistant point contacts symmetrically located on the top face, and (2) point voltage contacts symmetrically located on the top face and point current contacts centered on the end faces. In studies of these cases, curves are given for determining the geometries which give, between the voltage contacts, current densities directed parallel to the sample length. Although in the development it is assumed that the resistivity is homogeneous and isotropic and that there is no magnetic field present, a discussion is given on the applicability to anisotropic resistivity and low magnetic fields. Experimental verification is given.
机译:样品的电阻率由ρ=VI-12πsF给出,其中V是电压,I是电流,s是电压触点间距,F是适合样品几何形状的校正因子。对于平行六面体样品具有以下校正因子:(1)非等距点触点对称地位于顶面上,(2)点电压触点对称地位于顶面上,而点电流触点位于端面的中心。在对这些情况的研究中,给出了用于确定几何形状的曲线,这些几何形状在电压触点之间给出了平行于样本长度的电流密度。尽管在开发过程中假设电阻率是均质且各向同性的,并且不存在磁场,但是对各向异性电阻率和低磁场的适用性进行了讨论。实验验证。

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  • 来源
    《Journal of Applied Physics》 |1971年第7期|共6页
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  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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