Rapid Annealing of Pulse‐Radiation‐Induced Space Charge in Silicon Dioxide

Simons M.; Hughes H. L.

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Rapid Annealing of Pulse‐Radiation‐Induced Space Charge in Silicon Dioxide

机译：二氧化硅中脉冲辐射诱导的空间电荷的快速退火

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来源
《Journal of Applied Physics》 |1971年第7期|共2页
作者
Simons M.; Hughes H. L.;
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Research Triangle Institute, Research Triangle Park, North Carolina 27709;

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收录信息美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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正文语种 eng
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Rapid Annealing of Pulse‐Radiation‐Induced Space Charge in Silicon Dioxide

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