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ac electrical properties and I‐V characteristics of MoO3 film under dc bias

机译:直流偏置下MoO3薄膜的交流电性能和I-V特性

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摘要

The ac electrical properties and the I-V Δ characteristics of AuMoO3Au thin-film sandwiches were measured under dc voltage bias. The capacitance of the samples is a strong function of the temperature and dc voltage bias. It increases as much as a factor of 20 for a 2900-Å-thick sample as the temperature is increased; this variation is reduced with increasing voltage bias. At 325 °K the capacitance is a strong function of the dc voltage bias, decreasing from its zero-bias value by about 50% at V = 1.5 V. The voltage dependence of the capacitance decreases with decreasing temperature, and at T = 77 °K it is essentially voltage independent. The conductance is also observed to be strongly dependent on temperature and dc voltage bias. For V>~0.6  face=''roman''>V, it initially increases strongly with increasing temperature and reaches a maximum value at about 310 °K. With further increase in temperature, it decreases to a minimum value and then increases monotonically. For face=''roman''>V≳0.6  face=''roman''>V, the conductance increases monotonically with increasing temperature. The I-V characteristics under dc bias are essentially thickness independent for V>~0.6  face=''roman''>V and thickness dependent for V≳0.6  face=''roman''>V. All the results are interpreted in terms of a self-consistent model that incorporates Schottky barriers at the two metal-insulator interfaces and a conduction process that exhibits an electrode-limited to bulk-limited transition occurring at V ≅ 0.6 V.
机译:在直流电压偏置下测量AuMoO3Au薄膜夹心的交流电性能和I-VΔ特性。样品的电容是温度和直流电压偏置的强函数。对于2900Å厚的样品,随着温度的升高,它的升高幅度高达20倍。随着电压偏置的增加,该变化减小。在325°K时,电容是dc电压偏置的强函数,在V = 1.5 V时,其零偏置值减小约50%。电容的电压依赖性随温度降低而降低,在T = 77°时K本质上与电压无关。还观察到电导在很大程度上取决于温度和直流电压偏置。对于V> 〜0.6 face =“ roman''> V ,其最初随着温度的升高而强烈增加,并在约310°K时达到最大值。随着温度的进一步升高,它降低到最小值,然后单调升高。对于 face =“ roman''> V ≳0.6 face =” roman''> V ,电导随温度升高而单调增加。直流偏置下的IV特性对于V> 〜0.6 face =“ roman''> V 基本上与厚度无关,而对于V≳0.6 face =' 'roman''> V 。所有结果均根据自洽模型进行解释,该模型在两个金属-绝缘体界面处合并了肖特基势垒,并且导电过程表现出在V≥0.6 V时发生电极限制到体积限制的转变。

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  • 来源
    《Journal of Applied Physics 》 |1972年第9期| 共7页
  • 作者

    Nadkarni G. S.; Simmons J. G.;

  • 作者单位

    Electrical Engineering Department, University of Toronto, Toronto, Canada 13990;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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