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Comparison of Langmuir Probe and rf Capacitance Probe Electron Density Measurements in Low‐Density Plasmas

机译:低密度等离子体中Langmuir探针和RF电容探针电子密度测量的比较

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摘要

Electron densities calculated from data obtained in the laboratory by dc and ac probes simultaneously exposed to low‐density low‐pressure air plasmas are compared. With electron densities between about 1011 and 1012 m-3 and collision frequencies on the order of 108 sec-1, data from a rf capacitance probe operating near 5 MHz and data from the ion saturation region of a dc probe each yield electron density values that generally agree within a factor of 2. By the use of a differential pressure cell, lower electron densities, ∼109 m-3, and reduced collision frequencies, ≪105 sec-1, were obtained. Under the latter conditions the dc probe operation was erratic but the ac probe operated satisfactorily, and operated as expected theoretically even under the laboratory limitations.
机译:比较了从实验室中同时暴露于低密度低压空气等离子体中的直流和交流探头获得的数据计算出的电子密度。在大约1011和1012 m-3之间的电子密度和108 sec-1数量级的碰撞频率下,来自工作在5 MHz附近的rf电容探针的数据和来自dc探针的离子饱和区的数据各自产生的电子密度值通常在2倍的范围内一致。通过使用压差传感器,可以获得较低的电子密度(约109 m-3)和降低的碰撞频率(约105 sec-1)。在后一种情况下,直流探针操作不稳定,但交流探针操作令人满意,即使在实验室限制下,理论上也能按预期运行。

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  • 来源
    《Journal of Applied Physics》 |1972年第7期|共3页
  • 作者

    Smith Jack;

  • 作者单位

    Electrical Engineering Department, The University of Texas at El Paso, El Paso, Texas 79968;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
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