Thermomagnetic writing on thin‐film MnBi using an electron beam

摘要

Thermomagnetic writing of small areas on MnBi thin films using an electron beam has been demonstrated both on unheated films and on films maintained at an elevated temperature during the writing procedure. Experiments in which the incident energy of the beam was varied have allowed a safe writing region to be established. Factors which influence the written spot diameter are discussed.