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首页> 外文期刊>Journal of Applied Physics >Concentration dependence of the refractive index for n ‐ and p ‐type GaAs between 1.2 and 1.8 eV
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Concentration dependence of the refractive index for n ‐ and p ‐type GaAs between 1.2 and 1.8 eV

机译:n型和p型GaAs的折射率在1.2至1.8 eV之间的浓度依赖性

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The refractive indices of GaAs at room temperature were determined from accurate double‐beam reflectance measurements. The uncertainty in the refractive indices obtained by this technique is ±0.005. Measurements were made on high‐purity n ‐type samples, n ‐type samples with free‐electron concentrations from 5×1016 to 6.7×1018 cm-3, p ‐type samples with free‐hole concentrations from 1.5×1016 to 1.6×1019 cm-3, and p ‐type samples heavily doped with the amphoteric impurity Si. These data agree with Marple''s prism refractive data for both of his samples of the same impurity concentration. Analysis of the reflectance for the high‐purity samples permitted assignment of the room‐temperature energy gap as 1.424±0.001 eV. The shape of the refractive‐index‐vs‐energy curve was found to be strongly dependent on the carrier concentration at energies near the direct energy gap.
机译:GaAs在室温下的折射率是通过精确的双光束反射率测量确定的。通过该技术获得的折射率的不确定度为±0.005。对高纯度n型样品,自由电子浓度为5×1016至6.7×1018 cm-3的n型样品,自由孔浓度为1.5×1016至1.6×1019的p型样品进行了测量cm-3和p型样品重掺杂了两性杂质Si。这些数据与Marple的两个杂质浓度相同的样品的棱镜折射数据一致。通过对高纯度样品的反射率进行分析,可以将室温能隙指定为1.424±0.001 eV。发现折射率与能量的关系曲线的形状在很大程度上取决于直接能隙附近能量处的载流子浓度。

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    《Journal of Applied Physics 》 |1974年第6期| P.2650-2657| 共8页
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  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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