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Refractive index dependence on free carriers for GaAs

机译:砷化镓对自由载流子的折射率依赖性

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This work reports on the influence of the injected free carriers on GaAs refractive index N at 297 °K. The variation of N caused by injected free carriers was theoretically calculated in a more complete way than has been performed earlier. New results were obtained rather than those of a reducing effect on N in a linearlike dependence on the injected free carrier concentration n. They are: (1) linearlike dependence of N on n occurs only beyond a certain value n1 and (2) an increasing effect on N is caused by the injected free carriers for concentrations in the range between n=0 and a certain value of n=nc (nc≪n1) . In the range nc≪n≪n1 a nonlinear decreasing effect was obtained. Effect (2) has not been noticed up to now, so far as the authors know.
机译:这项工作报告了注入的自由载流子对297°K下GaAs折射率N的影响。理论上,由注入的自由载流子引起的N的变化比以前更完整地计算出来。获得了新的结​​果,而不是减少了对N的影响,这些结果与注入的自由载流子浓度n呈线性关系。它们是:(1)N对n的线性依赖性仅在超过特定值n1时才会发生,并且(2)在浓度n = 0到n的特定值之间注入的自由载流子对N的影响增加= nc(nc≪n1)。在nc≪n≪n1范围内,获得了非线性降低效果。据作者所知,到目前为止,效果(2)尚未被注意到。

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    《Journal of Applied Physics 》 |1980年第8期| P.4365-4367| 共3页
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  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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