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首页> 外文期刊>Journal of Applied Physics >Thin‐film detector performance on a one megabit magnetic bubble memory
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Thin‐film detector performance on a one megabit magnetic bubble memory

机译:一兆位磁泡存储器上的薄膜检测器性能

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Magnetic bubble memories have been fabricated with thin‐film detectors which have a 4× improvement in signal amplitude over conventional chevron detectors. The detectors have a nominal 20‐mV signal at 25 °C when operated in a bridge configuration from a 12‐V supply. Random noise on the signal has an rms value of ∼250 μV. The temperature coefficient of the signal is approximately -1%/°C. Signal variation with drive field amplitude is ∼1% for a 1% drive field variation over a ±10% range about nominal (60‐Oe) drive. The standard conductor first structure is used, with the thin‐film detector situated between two silicon dioxide spacer layers under the conductor metalization. Nominal detector thickness is 50 nm. Relatively high detector resistance (2.5 KΩ) reduces on‐chip power dissipation to less than half that of conventional chevron detectors. Contact to the thin‐film detector is made through vias in the spacer layer. Metal‐to‐metal contact between the Al(Cu) conductor metalization and the Permalloy thin‐film detector is assured by an in‐situ sputter etch prior to Al/(Cu) deposition.
机译:磁气泡存储器是用薄膜检测器制造的,与传统的人字形检测器相比,其信号幅度提高了4倍。当以12V电源在电桥配置下运行时,检测器在25 C时具有20mV的标称信号。信号上的随机噪声的均方根值为〜250μV。信号的温度系数约为-1%/°C。在正常(60-Oe)驱动范围的±10%范围内,如果1%的驱动场变化,则信号随驱动场振幅的变化约为1%。使用标准的导体优先结构,薄膜检测器位于导体金属化之下的两个二氧化硅间隔层之间。标称检测器厚度为50 nm。较高的检测器电阻(2.5KΩ)可将片上功耗降至传统人字形检测器的一半以下。通过间隔层中的通孔与薄膜检测器接触。 Al(Cu)导体金属化层和坡莫合金薄膜检测器之间的金属接触是通过在Al /(Cu)沉积之前进行原位溅射蚀刻来确保的。

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    《Journal of Applied Physics》 |1982年第3期|P.2540-2542|共3页
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  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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