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首页> 外文期刊>Journal of Applied Physics >Low temperature photoluminescence and cathodoluminescence studies of nonpolar GaN grown using epitaxial lateral overgrowth
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Low temperature photoluminescence and cathodoluminescence studies of nonpolar GaN grown using epitaxial lateral overgrowth

机译:外延横向过生长生长的非极性GaN的低温光致发光和阴极发光研究

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Low temperature cathodo- and photoluminescence has been performed on nonpolar a-plane GaN films grown using epitaxial lateral overgrowth. In films overgrown at a low V–III ratio, the emission spectrum is dominated by “yellow” and “blue” luminescence bands, attributed to recombination at point defects or impurities. The intensity of this emission is observed to decrease steadily across the window region along the -c direction, possibly due to asymmetric diffusion of a point defect/impurity species. When overgrown at a higher V–III ratio, the near band edge and basal-plane stacking fault emission intensity increases by orders of magnitude and a donor–acceptor pair band is observed. Using monochromatic cathodoluminescence imaging, the various emission features are correlated with the microstructure of the film. In particular, the peak energy of the basal-plane stacking fault emission is seen to be blueshifted by ∼15 meV in the wing relative to the window region, which may be related to the different strain states in the respective regions.
机译:低温阴极和光致发光已经在使用外延横向过生长生长的非极性a面GaN膜上进行了。在以低V–III比例过度生长的薄膜中,发射光谱以“黄色”和“蓝色”发光带为主,这归因于点缺陷或杂质的复合。观察到此发射的强度沿-c方向跨窗口区域稳定下降,这可能是由于点缺陷/杂质种类的不对称扩散所致。当在较高的V–III比下生长过度时,近带边缘和基面堆叠断层的发射强度会增加几个数量级,并且会观察到供体-受体对带。使用单色阴极发光成像,各种发射特征与薄膜的微观结构相关。特别是,相对于窗口区域,机翼上的基面堆叠断层辐射的峰值能量被蓝移了约15 meV,这可能与各个区域的不同应变状态有关。

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