Study of nanospheres lithography technology with super-lens for fabricating nano holes

摘要

A maskless nano-lithography method by using polystyrene spheres (PSs) self-assembled on silver slab (NSSL) was proposed by Li etal [Opt. Express 16(19), 14397 (2008)]. In order to understand the mechanism of the lithography technology in depth and improve the experiment results, we studied the energy distribution and the frequency spectrum of incident lights passing through the PS and Ag film. To optimize parameters, the effects of several important factors on the resolution were analyzed. The curves of the optimal Ag film thickness and the highest lithography resolution versus the PS diameter were presented by calculations. Based on the results of the calculations, experiments under the optimization condition were performed and nano holes with dimension of 75 nm and a period of 600 nm were obtained.