机译:对钨,钽和氮化钽扩散屏障的铜基纳米型纳米移层导热率的界面和层周期性效应
Empa Swiss Federal Laboratories for Materials Science and Technology Uberlandstrasse 129 8600 Duebendorf Switzerland;
Department of Mechanical and Aerospace Engineering University of Virginia Charlottesville Virginia 22904 USA;
Department of Mechanical and Aerospace Engineering University of Virginia Charlottesville Virginia 22904 USA;
Logic Technology Development Intel Corporation Hillsboro Oregon 97124 USA;
Logic Technology Development Intel Corporation Hillsboro Oregon 97124 USA;
Logic Technology Development Intel Corporation Hillsboro Oregon 97124 USA;
Logic Technology Development Intel Corporation Hillsboro Oregon 97124 USA;
Empa Swiss Federal Laboratories for Materials Science and Technology Uberlandstrasse 129 8600 Duebendorf Switzerland;
Empa Swiss Federal Laboratories for Materials Science and Technology Uberlandstrasse 129 8600 Duebendorf Switzerland;
Department of Mechanical and Aerospace Engineering University of Virginia Charlottesville Virginia 22904 USA Department of Materials Science and Engineering University of Virginia Charlottesville Virginia 22904 USA Physics Department University of Virginia Charlottesville Virginia 22904 USA;
机译:等离子体浸没离子注入形成的氮化钽扩散阻挡层用于铜金属化的热稳定性
机译:钽扩散阻挡层,可提高Al_xO_y / Pt / Al_xO_y多层太阳能吸收器的热稳定性
机译:无籽铜与钽扩散阻挡层之间的Ti,Pt和Ru界面层的热稳定性
机译:钽氮化物薄膜的化学气相沉积使用五丁基(乙基甲基氨基)钽(PEMAT)作为Cu金属化的扩散屏障:离子束轰击的热分解和影响
机译:氮化钛,氮化钽和氮化钨作为铜和二氧化硅之间的扩散阻挡层的比较研究。
机译:薄膜转移用于制造具有可控分层结构的氮化钽光电极用于水分解
机译:对钨,钽和氮化钽扩散屏障的铜基纳米型纳米移层导热率的界面和层周期性效应