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The influence of wavelength on phase transformations induced by picosecond and femtosecond laser pulses in GeSb thin films

机译:波长对GeSb薄膜中皮秒和飞秒激光脉冲引起的相变的影响

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摘要

Cycling between the crystalline and amorphous phases of 25-nm-thick GeSb films induced by single laser pulses of duration of 100 fs or 20 ps is investigated in the 400-800 nm wavelength range. The time evolution of the phase transformations has been studied with picosecond resolution real-time reflectivity measurements at a probe wavelength of 514.5 nm and also with femtosecond and picosecond pump-probe measurements. Upon picosecond irradiation, three regimes are identified: for wavelengths below ~550 nm and above ~750 nm, the total time to transform between the crystalline and amorphous phases is of the order of 10-24 ns while in the intermediate wavelength range of 600-750 nm, the transformation time is only ~650 ps. Upon 100 fs irradiation, the transformation times are observed to decrease with increasing wavelength with the shortest times of ~5 ns for crystallization and ~10 ns for amorphization, both occurring at 800 nm. This behavior is discussed in terms of how the wavelength-dependent refractive index of the phases involved influences the initial supercooling of the molten volume and the subsequent resolidification scenario.
机译:在400-800 nm波长范围内,研究了由持续时间为100 fs或20 ps的单个激光脉冲引起的25 nm厚的GeSb薄膜的晶相和非晶相之间的循环。已使用皮秒分辨率实时反射率测量(在514.5 nm的探针波长下)以及飞秒和皮秒泵浦探针测量研究了相变的时间演化。在皮秒辐射下,可确定三种状态:对于低于550 nm和高于750 nm的波长,在晶相和非晶相之间转变的总时间为10-24 ns,而在600-700 nm的中间波长范围内750 nm,转换时间仅为〜650 ps。在100 fs的辐射下,观察到转变时间随波长增加而减少,最短的结晶时间为〜5 ns,无定形的最短时间为〜10 ns,都发生在800 nm处。根据所涉及的相的波长相关的折射率如何影响熔融体积的初始过冷以及随后的再固化情况,来讨论这种行为。

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