Crossover in growth exponent upon nanocrystallization of amorphous thin films

摘要

Thin films of Fe_(75)Zr_(25) alloy were deposited by cosputtering of Fe and Zr targets using magnetron sputtering technique in the thickness range of 7-85 nm. It was found that at a critical thickness of about 40 nm, nanocrystallization of initially deposited amorphous phase takes place. A crossover occurs in the growth exponent (β) upon nanocrystallization giving a direct evidence for different growth behavior for amorphous and nanocrystalline phases.