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Positron beam studies of argon-irradiated polycrystal α-Zr

机译:氩辐照多晶α-Zr的正电子束研究

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Doppler broadening spectroscopy was performed using a variable-energy positron beam to investigate the effect of defects induced by 150-keV Ar-ion-irradiated α-Zr bulk material. S parameter in the damaged layer of the as-irradiated sample induced by ion irradiation increased with the increasing implantation dose. Isochronal annealing between 350 and 800℃ in vacuum studies was carried out to investigate the thermal stability of defects in the oxide surface and damaged layer for low-dose (1 X 10~(14)cm~2) and high-dose (1 X 10~(16)cm~2) irradiated samples. The results of S-W plot measured at different annealing temperatures showed that the positron-trapping center had changed. The Ar-decorated voids or vacancies, which formed in high-dose implantation samples by Ar ions combining with open-volume defects, are stable and do not recover until at high annealing temperatures. Comparing the annealing behavior of the high-dose and low-dose implantation samples show that the recovery process of open-volume defects such as vacancies and voids will be delayed by the excess Ar concentration.
机译:使用可变能量正电子束进行多普勒加宽光谱研究,以研究150keV Ar离子辐照的α-Zr块状材料引起的缺陷的影响。离子辐照引起的辐照样品损伤层中的S参数随注入剂量的增加而增加。在低剂量(1 X 10〜(14)cm〜2)和高剂量(1 X)下,在350至800℃的温度下进行等时退火,研究氧化物表面和受损层缺陷的热稳定性。 10〜(16)cm〜2)照射的样品。在不同退火温度下测得的S-W图结果表明,正电子俘获中心发生了变化。高剂量注入样品中由Ar离子结合开孔缺陷形成的Ar装饰空隙或空位是稳定的,只有在高退火温度下才能恢复。比较高剂量和低剂量注入样品的退火行为表明,过量的Ar浓度会延迟开孔缺陷(如空位和空隙)的恢复过程。

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