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首页> 外文期刊>Journal of Applied Physics >Diamondlike carbon film deposition on a polycarbonate-tube inner wall using a cylindrical electrode with radio frequency glow discharge plasma
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Diamondlike carbon film deposition on a polycarbonate-tube inner wall using a cylindrical electrode with radio frequency glow discharge plasma

机译:使用带有射频辉光放电等离子体的圆柱形电极在聚碳酸酯管内壁上沉积类金刚石碳膜

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摘要

Radio frequency (rf) plasma chemical vapor deposition (CVD) process is very useful for film deposition. However, common rf plasma CVD techniques using planar electrodes make it difficult to apply to three-dimensional insulator structures. In this study, to deposit diamondlike carbon (DLC) films on a polycarbonate-tube inner wall (φ 11 mm, length 100 mm), we have developed the cylindrical electrode plasma process. This process could be adapted to cylindrical substrates such as polymeric tubes. In investigating the availability of this process, under helium (He) gas pressures (50, 100, and 150 Pa), the plasma states of the rf power at 30 W were measured using a double-probe method. The He plasma was generated bright as a stable, hollow cathode discharge inside the polycarbonate tube. As a result, the cylindrical electrode process was expected to have applications for cylindrical materials such as polymeric tubes. In actual deposition of DLC film (CH_4 gas at 10 Pa, rf power at 30 W, and deposition time at 10 min), the DLC film was deposited completely on the polycarbonate-tube inner wall. The distribution of the film thickness was 300-350 nm, and the structures of the DLC film were uniform. It was observed that the DLC film was deposited uniformly. The cylindrical electrode process is expected to apply to three-dimensional insulator structures such as polymeric tubes.
机译:射频(rf)等离子体化学气相沉积(CVD)工艺对于膜沉积非常有用。然而,使用平面电极的常见的射频等离子体CVD技术使得难以应用于三维绝缘体结构。在这项研究中,为了将类金刚石碳(DLC)膜沉积在聚碳酸酯管内壁(φ11 mm,长度100 mm)上,我们开发了圆柱形电极等离子体工艺。该过程可以适用于圆柱形基底,例如聚合物管。在研究此过程的可用性时,在氦(He)气压力(50、100和150 Pa)下,使用双探针法测量了30 W时rf功率的等离子体状态。氦等离子体在聚碳酸酯管内部稳定而空心的阴极放电时发出明亮的光。结果,期望圆柱形电极工艺可用于圆柱形材料如聚合物管。在实际沉积DLC膜(10 Pa的CH_4气体,30 W的rf功率和10分钟的沉积时间)中,DLC膜完全沉积在聚碳酸酯管内壁上。膜厚度的分布为300-350nm,并且DLC膜的结构是均匀的。观察到DLC膜均匀沉积。圆柱形电极工艺有望应用于三维绝缘体结构,例如聚合物管。

著录项

  • 来源
    《Journal of Applied Physics》 |2005年第2期|p.024906.1-024906.5|共5页
  • 作者单位

    Department of Electronic and Computer Engineering, Faculty of Science and Engineering, Tokyo Denki University, Ishizaka Hatoyama, Saitama 350-0394, Japan;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 应用物理学;
  • 关键词

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