首页> 外文期刊>Journal of Applied Physics >Effects of Si doping on normal incidence InAs/In_(0.15)Ga_(0.85)As dots-in-well quantum dot infrared photodetectors
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Effects of Si doping on normal incidence InAs/In_(0.15)Ga_(0.85)As dots-in-well quantum dot infrared photodetectors

机译:Si掺杂对阱中量子点红外光探测器InAs / In_(0.15)Ga_(0.85)As正入射的影响

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摘要

The effects of doping on InAs/In_(0.15)Ga_(0.85)As quantum dots-in-well infrared photodetectors have been studied by measuring the dark current, photocurrent, and spectral response. A significant reduction of dark current with decrease in doping concentration in the quantum dots has been observed. However, the photocurrent of the detectors increases with the doping. By measuring the background limited infrared photodetector temperature, we find that the optimum sheet doping concentration in these detectors is n=3 x 10~(10) cm~(-2) (corresponding to about one electron per dot).
机译:通过测量暗电流,光电流和光谱响应,研究了掺杂对InAs / In_(0.15)Ga_(0.85)As量子阱阱红外光电探测器的影响。已经观察到随着量子点中掺杂浓度的降低,暗电流显着降低。然而,检测器的光电流随着掺杂而增加。通过测量背景极限红外光电探测器的温度,我们发现这些探测器中的最佳片材掺杂浓度为n = 3 x 10〜(10)cm〜(-2)(相当于每个点约一个电子)。

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