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首页> 外文期刊>Journal of Applied Physics >Intrinsic exciton transitions in high-quality ZnO thin films grown by plasma-enhanced molecular-beam epitaxy on sapphire substrates
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Intrinsic exciton transitions in high-quality ZnO thin films grown by plasma-enhanced molecular-beam epitaxy on sapphire substrates

机译:在蓝宝石衬底上通过等离子增强分子束外延生长的高质量ZnO薄膜中的内在激子跃迁

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摘要

High-quality ZnO thin films have been grown by plasma-enhanced molecular-beam epitaxy on sapphire substrates. Free-exciton absorption and exciton-LO phonon absorption peaks are observed in the films at room temperature, indicating that the exciton states are stable even at room temperature. Three excitonic transitions associated with valence bands A, B, and C are clearly revealed in the reflectance spectrum measured at low temperatures. This result indicates that the ZnO thin films have a perfect wurtzite crystal structure. Biexciton emission is observed in the photoluminescence spectra at low temperatures, from which the biexciton binding energy is estimated to be 14.5 meV, in good agreement with previous results. Exciton-LO (Ex-LO) and exciton-2LO (Ex-2LO) photon emission peaks are observed at low temperature. The energy difference between the Ex-LO and Ex-2LO bands is about 72.5 meV, which coincides with previously reported values of the LO phonon energy for ZnO thin films.
机译:通过等离子增强的分子束外延在蓝宝石衬底上生长了高质量的ZnO薄膜。在室温下在薄膜中观察到自由激子吸收和激子-LO声子吸收峰,表明即使在室温下,激子态也是稳定的。在低温下测得的反射光谱中清楚地显示出与价带A,B和C相关的三个激子跃迁。该结果表明ZnO薄膜具有完美的纤锌矿晶体结构。在低温下在光致发光光谱中观察到双激子发射,据估计双激子结合能为14.5 meV,与先前的结果非常吻合。在低温下观察到激子LO(Ex-LO)和激子2LO(Ex-2LO)光子发射峰。 Ex-LO和Ex-2LO谱带之间的能量差约为72.5 meV,这与先前报道的ZnO薄膜的LO声子能量值一致。

著录项

  • 来源
    《Journal of Applied Physics》 |2006年第6期|p.063709.1-063709.4|共4页
  • 作者单位

    Key Laboratory of Luminescence and Optical Information, Ministry of Education, Institute of Optoelectronic Technology, Beijing Jiaotong University, Beijing 100044, People's Republic of China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 应用物理学;计量学;
  • 关键词

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