首页> 外文期刊>Journal of Applied Physics >Determination of energy-band offsets between GaN and AlN using excitonic luminescence transition in AlGaN alloys
【24h】

Determination of energy-band offsets between GaN and AlN using excitonic luminescence transition in AlGaN alloys

机译:使用AlGaN合金中的激子发光跃迁确定GaN和AlN之间的能带偏移

获取原文
获取原文并翻译 | 示例
获取外文期刊封面目录资料

摘要

We report the determination of the energy-band offsets between GaN and AlN using the linewidth (full width at half maximum) of an extremely sharp excitonic luminescence transition in Al_xGa_(1-x)N alloy with x = 0.18 at 10 K. Our sample was grown on C-plane sapphire substrate by metal-organic chemical-vapor deposition at 1050℃. The observed value of the excitonic linewidth of 17 meV is the smallest ever reported in literature. On subtracting a typical value of the excitonic linewidth in high-quality GaN, namely, 4.0 meV, we obtain a value of 13.0 meV, which we attribute to compositional disorder. This value is considerably smaller than that calculated using a delocalized exciton model [S. M. Lee and K. K. Bajaj, J. Appl. Phys. 73, 1788 (1993)]. The excitons are known to be strongly localized by defects and/or the potential fluctuations in this alloy system. We have simulated this localization assuming that the hole, being much more massive than the electron, is completely immobile, i.e., the hole mass is treated as infinite. Assuming that the excitonic line broadening is caused entirely by the potential fluctuations experienced by the conduction electron, the value of the conduction-band offset between GaN and AlN is determined to be about 57% of the total-band-gap discontinuity. Using our model we have calculated the variation of the excitonic linewidth as a function of Al composition in our samples with higher Al content larger than 18% and have compared it with the experimental data. We also compare our value of the conduction-band offset with those recently proposed by several other groups using different techniques.
机译:我们报告了在10 K下使用x = 0.18的Al_xGa_(1-x)N合金中极其尖锐的激子发光跃迁的线宽(半峰全宽)确定GaN和AlN之间的能带偏移的方法。在1050℃通过金属有机化学气相沉积法在C面蓝宝石衬底上生长。激子线宽的观测值为17 meV,是文献中报道的最小值。减去高质量GaN中的激子线宽的典型值即4.0 meV,我们得到的值为13.0 meV,这归因于成分无序。该值比使用非局域激子模型计算的值小得多。 M. Lee和K. K. Bajaj,J. Appl。物理73,1788(1993)]。已知激子强烈受该合金系统中的缺陷和/或电势波动的限制。我们已经模拟了这种定位,假设比电子大得多的空穴是完全不动的,即空穴质量被视为无限大。假定激子线变宽完全是由导电电子所经历的电势波动引起的,则确定GaN和AlN之间的导带偏移值约为总带隙不连续性的57%。使用我们的模型,我们计算出Al含量大于18%的样品中激子线宽随Al组成的变化,并将其与实验数据进行了比较。我们还将导带偏移的值与其他几个小组最近使用不同技术提出的值进行比较。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号