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Photoemission study of tris(8-hydroxyquinoline) aluminum/aluminum oxide/tris(8-hydroxyquinoline) aluminum interface

机译:三(8-羟基喹啉)铝/氧化铝/三(8-羟基喹啉)铝界面的光发射研究

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摘要

The evolution of the interface electronic structure of a sandwich structure involving aluminum oxide and tris(8-hydroxyquinoline) aluminum (Alq), i.e., (Alq/AlO_x/Alq), has been investigated with photoemission spectroscopy. Strong chemical reactions have been observed due to aluminum deposition onto the Alq substrate. The subsequent oxygen exposure releases some of the Alq molecules from the interaction with aluminum. Finally, the deposition of the top Alq layer leads to an asymmetry in the electronic energy level alignment with respect to the AlO_x. interlayer.
机译:已经通过光发射光谱研究了包含氧化铝和三(8-羟基喹啉)铝(Alq)的夹层结构(即(Alq / AlO_x / Alq))的界面电子结构的演变。由于铝沉积在Alq基板上,已观察到强烈的化学反应。随后的氧气暴露从与铝的相互作用中释放了一些Alq分子。最后,顶部Alq层的沉积导致相对于AlO_x的电子能级对准不对称。夹层。

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