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首页> 外文期刊>Journal of Applied Physics >Measurement of temperature-dependent defect diffusion in proton-irradiated GaN(Mg, H)
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Measurement of temperature-dependent defect diffusion in proton-irradiated GaN(Mg, H)

机译:质子辐照GaN(Mg,H)中随温度变化的缺陷扩散的测量

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Deuterated p-type GaN(Mg,~2H) films were irradiated at room temperature with 1 MeV protons to create native point defects with a concentration approximately equal to the Mg doping (5 X 10~(19) cm~(-3)). The samples were then annealed isothermally at a succession of temperatures while monitoring the infrared absorption due to the H local mode of the MgH defect. As the samples were annealed, the MgH absorption signal decreased and a new mode at slightly higher frequency appeared, which has been associated with the approach of a mobile nitrogen interstitial. We used the time dependence of the MgH absorption to obtain a diffusion barrier of the nitrogen interstitial in p-type GaN of 1.99 eV. This is in good agreement with theoretical calculations of nitrogen interstitial motion in GaN.
机译:在室温下用1 MeV质子辐照氘化的p型GaN(Mg,〜2H)膜以产生自然点缺陷,其浓度约等于Mg掺杂(5 X 10〜(19)cm〜(-3)) 。然后将样品在一系列温度下等温退火,同时监测由于MgH缺陷的H局部模式而引起的红外吸收。随着样品的退火,MgH吸收信号降低,并出现了频率略高的新模式,这与移动氮间隙的方法有关。我们使用MgH吸收的时间依赖性来获得1.99 eV的p型GaN中氮间隙的扩散势垒。这与GaN中氮间隙运动的理论计算非常吻合。

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