Temperature scanning small angle x-ray scattering measurements of structural relaxation in type-Ill vitreous silica

摘要

The fictive temperature of vitreous silica containing approximately 900 wt ppm of hydroxyl groups was monitored with small angle x-ray scattering. The measurements were carried out during annealing and while scanning the temperature, with annealing temperatures ranging between 930 and 1330 K. Fitting the data to the Adam-Gibbs-Fulcher equation by using the Tool-Narayanaswamy method yields a particularly simple thermorheological behavior for type-Ill vitreous silica. Unlike the general case for glass kinetics, including vitreous silica with low hydroxyl content, the relaxation time constant is nearly decoupled from the fictive temperature. This high degree of decoupling of the state of the glass and the relaxation rate agrees with the results of viscosity measurements. By improving the data analysis procedure, we have significantly increased the precision of the results, and it was possible to resolve changes of the activation energy of the relaxation processes to within 0.5%. This has made sample aging effects that had previously been undetectable visible.