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Morphology and hard magnetic properties of epitaxial Nd-Fe-B films grown on Mo and Cr/Ta buffers

机译:在Mo和Cr / Ta缓冲液上生长的外延Nd-Fe-B薄膜的形貌和硬磁性能

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摘要

Epitaxial hard magnetic Nd-Fe-B films were deposited on a Mo buffer layer on MgO(100) substrates by pulsed laser deposition and compared with films on a combined Cr/Ta buffer layer. On Mo buffers, films grow relatively smooth and continuous compared to Cr/ Ta buffer, where the films posses a rough surface and granular. These differences in morphology are discussed with respect to lattice misfit and wettability, and they can explain the observed strong difference in coercivity. Despite the low coercivity the lower phase formation temperature and more continuous growth of Nd-Fe-B on Mo buffer may be of advantage for patterned media applications, which require smooth and continuous films.
机译:通过脉冲激光沉积将外延硬磁Nd-Fe-B膜沉积在MgO(100)基板上的Mo缓冲层上,并将其与组合Cr / Ta缓冲层上的膜进行比较。在Mo缓冲液上,与Cr / Ta缓冲液相比,膜的表面较粗糙且呈颗粒状,因此其生长相对平滑且连续。讨论了这些形态上的差异,涉及晶格失配和润湿性,它们可以解释观察到的矫顽力的巨大差异。尽管矫顽力低,但是较低的相形成温度和Nd-Fe-B在Mo缓冲液上的更连续的生长对于需要平滑且连续薄膜的图案化介质应用可能是有利的。

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