An approach to evaluate the microwave-detected photoconductance decay (MWPCD) is developed, which allows to extract the minority carrier lifetime as a function of the excess carrier density from a single MWPCD measurement. The method is shown to be applicable to thin (w ≤ 200 μm) silicon wafers with low minority carrier recombination at the surfaces and bulk lifetimes in the range of about 1-100 μs. Comparison of the MWPCD results with minority carrier lifetime measurements using the quasi-steady-state photoconductance method reveals very good agreement between both types of measurement. Only when the photoconductance exceeds 30% of the dark conductivity, is a deviation observed, because then the MWPCD signal is no longer directly proportional to the excess carrier density. Minority carrier trapping is found to affect the MWPCD signal only in the tail of the measured photoconductance decay. The evaluation method is used to map the interstitial iron content with high spatial resolution, as well as to determine the minority carrier trap density. An excellent agreement between numerical simulation and measured MWPCD signal is found revealing the assumptions made for the evaluation approach to be valid. This evaluation of the MWPCD measurement is well suited to characterize silicon of low purity and low crystalline quality, which is often employed to solar cells with high spatial resolution.
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