首页> 外文期刊>Journal of Applied Physics >Effects Of Submonolayer Mg On Cofe-mgo-cofe Magnetic Tunnel Junctions
【24h】

Effects Of Submonolayer Mg On Cofe-mgo-cofe Magnetic Tunnel Junctions

机译:亚单层镁对Cofe-Mgo-Cofe磁性隧道结的影响

获取原文
获取原文并翻译 | 示例
获取外文期刊封面目录资料

摘要

CoFe-MgO-CoFe magnetic tunnel junctions (MTJs) were fabricated by means of ion beam sputtering of MgO as well as subsequent thin films on CoFe. We demonstrated that when a submonolayer of Mg was deposited on the CoFe layer prior to the deposition of MgO, profound improvement in the performance of the CoFe-Mg-MgO-CoFe MTJ was achieved compared to that without the Mg layer. ac impedance measurement indicated that the interfacial Mg layer resulted in fivefold increase in the magnetoresistance ratio from 0.76% for MTJs without it to 4% for that with it. Complex-capacitance (CC) spectra of MTJs showed that the contribution in the relaxation frequency by textured MgO increased. This indicated that the submonolayer Mg improved the texture of the subsequently deposited MgO. Bias-dependent complex-impedance (CI) spectra reveal that interfacial defects were also suppressed due to the submonolayer of Mg. Results obtained from x-ray reflectivity and transmission electronic microscopy were also consistent with those of CI and CC.
机译:通过离子束溅射MgO以及随后在CoFe上的薄膜来制造CoFe-MgO-CoFe磁性隧道结(MTJ)。我们证明,当在MgO沉积之前先将Mg亚单层沉积在CoFe层上时,与没有Mg层相比,CoFe-Mg-MgO-CoFe MTJ的性能得到了显着改善。交流阻抗测量表明,界面Mg层使磁阻比从不带MTJ的0.76%增长到具有其的4%的五倍。 MTJ的复电容(CC)谱表明,织构MgO对弛豫频率的贡献增加。这表明亚单层Mg改善了随后沉积的MgO的织构。偏倚的复阻抗(CI)光谱表明,由于Mg的亚单层,界面缺陷也得到了抑制。从x射线反射率和透射电子显微镜获得的结果也与CI和CC的结果一致。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号