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首页> 外文期刊>Journal of Applied Physics >Determination of refractive indices and thicknesses of Ba_(0.7)Sr_(0.3)TiO_3 films with and without MgO (001) buffer layer on silicon substrate
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Determination of refractive indices and thicknesses of Ba_(0.7)Sr_(0.3)TiO_3 films with and without MgO (001) buffer layer on silicon substrate

机译:硅衬底上有无MgO(001)缓冲层的Ba_(0.7)Sr_(0.3)TiO_3薄膜的折射率和厚度的确定

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摘要

Ba_(0.7)Sr_(0.3)TiO_3 (BST30) thin films, deposited on single crystal Si (100) substrates with or without a MgO(001) buffer layer by the sol-gel method, have been investigated for their optical properties with a visible reflection spectrophotometer. An improved simplex numerical optimization method based on the reflectance spectra fitting is utilized to obtain the refractive indices and thicknesses of the thin films. Two models for the refractive index variations of the films (with or without a MgO buffer layer) together with a resemble double-layer structure are used to describe the films. The crystallization and microstructure of the films are characterized by the field emission scanning electron microscopy, which indicates that the MgO(001) buffer layer can significantly hold up the interdiffusion between the BST30 layer and the Si substrate, acuminate the interfaces, and improve the crystallinity of the BST thin film deposited on it. Furthermore, due to the large difference between the refractive index of the BST30 thin film and that of the MgO(001) buffer layer, which results in a strong beam confinement, a desirable waveguide structure could be constructed.
机译:通过溶胶-凝胶法研究了沉积在具有或不具有MgO(001)缓冲层的单晶Si(100)衬底上的Ba_(0.7)Sr_(0.3)TiO_3(BST30)薄膜的光学特性,其可见反射分光光度计。利用一种基于反射光谱拟合的改进的单纯形数值优化方法来获得薄膜的折射率和厚度。膜(有或没有MgO缓冲层)的折射率变化的两个模型以及类似的双层结构用于描述膜。薄膜的结晶和微观结构由场发射扫描电子显微镜表征,这表明MgO(001)缓冲层可以显着阻止BST30层与Si衬底之间的相互扩散,增强界面,并提高结晶度沉积在其上的BST薄膜。此外,由于BST30薄膜的折射率与MgO(001)缓冲层的折射率之间的差异较大,从而导致光束束缚很强,因此可以构建理想的波导结构。

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  • 来源
    《Journal of Applied Physics》 |2009年第7期|074103.1-074103.7|共7页
  • 作者单位

    State Key Laboratory of Modern Optical Instrumentation, Zhejiang University, Hangzhou 310027, China;

    State Key Laboratory of Modern Optical Instrumentation, Zhejiang University, Hangzhou 310027, China;

    State Key Laboratory of Modern Optical Instrumentation, Zhejiang University, Hangzhou 310027, China;

    State Key Laboratory of Modern Optical Instrumentation, Zhejiang University, Hangzhou 310027, China;

    State Key Laboratory of Modern Optical Instrumentation, Zhejiang University, Hangzhou 310027, China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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