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Mechanism of room temperature ferromagnetism in ZnO doped with Al

机译:Al掺杂ZnO中室温铁磁性的机理

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摘要

ZnO recently receives extensive interest owing to its potential applications in the dilute magnetic semiconductor. In this work, Al was deposited onto the surface of ZnO film followed by high vacuum annealing. The film showed the room temperature ferromagnetism (RTF). The saturation magnetization (M_s) highly depends on both the thickness of the Al top layer and the thickness of the ZnO film. The RTF disappeared when the film was further annealed in air atmosphere. The detailed structure characterizations (x-ray diffraction and x-ray photoelectron spectroscopy) revealed that the RTF was associated with a charge transfer between Al and Zn.
机译:ZnO由于其在稀磁半导体中的潜在应用而受到了广泛的关注。在这项工作中,将Al沉积在ZnO膜的表面上,然后进行高真空退火。影片显示了室温铁磁(RTF)。饱和磁化强度(M_s)高度取决于Al顶层的厚度和ZnO膜的厚度。当薄膜在空气中进一步退火时,RTF消失了。详细的结构表征(X射线衍射和X射线光电子能谱)表明,RTF与Al和Zn之间的电荷转移有关。

著录项

  • 来源
    《Journal of Applied Physics》 |2009年第3期|7-9|共3页
  • 作者单位

    Department of Materials Science and Engineering, National University of Singapore, Singapore 119260, Singapore;

    Department of Materials Science and Engineering, National University of Singapore, Singapore 119260, Singapore;

    Department of Materials Science and Engineering, National University of Singapore, Singapore 119260, Singapore;

    Department of Materials Science and Engineering, National University of Singapore, Singapore 119260, Singapore;

    Chartered Semiconductor Manufacturing Ltd., 60 Woodlands Industrial Park D, Singapore 738406, Singapore;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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