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机译:溅射和退火工艺中氧分压调节钇铁石榴石薄膜的磁性
State Key Laboratory of Electronic Films and Integrated Devices, University of Electronic Science and Technology of China, Chengdu 610054, China;
State Key Laboratory of Electronic Films and Integrated Devices, University of Electronic Science and Technology of China, Chengdu 610054, China;
State Key Laboratory of Electronic Films and Integrated Devices, University of Electronic Science and Technology of China, Chengdu 610054, China;
State Key Laboratory of Electronic Films and Integrated Devices, University of Electronic Science and Technology of China, Chengdu 610054, China;
Department of Physics and Astronomy, University of Delaware, Newark, Delaware 19716, USA;
机译:氧气退火温度对溶胶-凝胶法旋涂后钇铁石榴石(Y_3Fe_5O_(12))薄膜结构和磁性的影响
机译:石榴石薄膜概述(T钇铁石榴石和铝Ter钇铁石榴石)结构和磁性
机译:退火温度对射频溅射生长钇铁石榴石薄膜表面形貌和超低铁磁共振线宽的影响
机译:用溅射和退火工艺用氧气分压调节钇铁石榴石膜的磁性
机译:用原位TEM方法探测钇铁石榴石薄膜薄膜的形态学
机译:通过离轴溅射可调节垂直磁各向异性的高质量th铁石榴石薄膜–磁性和薄膜应变之间的关系
机译:薄钇铁石榴石薄膜中自旋波的磁性
机译:溅射沉积钇 - 氧系统的工艺参数 - 生长环境 - 薄膜性质关系。