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Tuning magnetic properties of yttrium iron garnet film with oxygen partial pressure in sputtering and annealing process

机译:溅射和退火工艺中氧分压调节钇铁石榴石薄膜的磁性

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摘要

In this paper, the magnetic properties of these films which deposited and annealed at different atmospheres were investigated. The experimental results show that the magnetic properties of yttrium iron garnet films prepared by rf magnetron sputtering method can be tuned with oxygen partial pressure in sputtering and annealing processes. The optimal condition is depositing in atmosphere of R=0 and annealing at 0.5 Pa O_2, or depositing in atmosphere of R=2% and annealed in vacuum.
机译:本文研究了在不同气氛下沉积和退火的这些薄膜的磁性。实验结果表明,通过射频磁控溅射法制备的钇铁石榴石薄膜的磁性能可以在溅射和退火过程中通过氧分压来调节。最佳条件是在R = 0的气氛中沉积并在0.5 Pa O_2下退火,或在R = 2%的气氛中沉积并在真空中退火。

著录项

  • 来源
    《Journal of Applied Physics 》 |2009年第2期| 110-112| 共3页
  • 作者单位

    State Key Laboratory of Electronic Films and Integrated Devices, University of Electronic Science and Technology of China, Chengdu 610054, China;

    State Key Laboratory of Electronic Films and Integrated Devices, University of Electronic Science and Technology of China, Chengdu 610054, China;

    State Key Laboratory of Electronic Films and Integrated Devices, University of Electronic Science and Technology of China, Chengdu 610054, China;

    State Key Laboratory of Electronic Films and Integrated Devices, University of Electronic Science and Technology of China, Chengdu 610054, China;

    Department of Physics and Astronomy, University of Delaware, Newark, Delaware 19716, USA;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
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