首页> 外文期刊>Journal of Applied Physics >Optical properties of ZnO/Zn_(0.9)Mg_(0.1)O multiple quantum wells grown on (111) Si using buffer assisted pulsed-laser deposition
【24h】

Optical properties of ZnO/Zn_(0.9)Mg_(0.1)O multiple quantum wells grown on (111) Si using buffer assisted pulsed-laser deposition

机译:使用缓冲辅助脉冲激光沉积在(111)Si上生长的ZnO / Zn_(0.9)Mg_(0.1)O多量子阱的光学性质

获取原文
获取原文并翻译 | 示例
           

摘要

This work investigates the photoluminescence properties of ZnO/Zn_(0.9)Mg_(0.1)O multiple quantum wells (MQWs), which have been fabricated by pulsed-laser deposition on (111) Si substrates using intervening epitaxial Lu_2O_3 buffer layers. In ZnO/Zn_(0.9)Mg_(0.1) MQWs, the luminescence is dominated by localized exciton (LE) emission throughout the whole temperature range studied. With increasing temperature from 10 to 300 K, the LE emission redshifts by 38 meV. This redshift is believed to be due to the thermalized excitons occupying higher-lying localized states where they emit higher energy radiation and temperature-induced band gap shrinkage. Moreover, the LE emission from the MQWs decays more slowly than exciton emission from ZnO. In addition, the LE emission in the MQWs shows a systematic blueshift with decreasing well width, which is consistent with a quantum size effect.
机译:这项工作研究了ZnO / Zn_(0.9)Mg_(0.1)O多量子阱(MQW)的光致发光特性,这些量子阱是通过使用外延Lu_2O_3中间缓冲层在(111)Si衬底上通过脉冲激光沉积而制造的。在ZnO / Zn_(0.9)Mg_(0.1)MQWs中,整个研究温度范围内的局部激子(LE)发射均主导着发光。随着温度从10 K升高到300 K,LE发射红移38 meV。认为这种红移是由于热激子占据了较高的局部态,它们在其中发射了更高的能量辐射和温度引起的带隙收缩。而且,MQWs的LE发射比ZnO的激子发射衰减更慢。此外,MQW中的LE发射显示出系统的蓝移,阱宽度减小,这与量子尺寸效应一致。

著录项

  • 来源
    《Journal of Applied Physics》 |2010年第3期|033102.1-033102.4|共4页
  • 作者单位

    State Key Laboratory of Silicon Materials, Zhejiang University, Hangzhou 310027, People's Republic of China Department of Materials Science and Engineering, University of Michigan, Ann Arbor, Michigan 48109,USA;

    Department of Materials Science and Engineering, University of Michigan, Ann Arbor, Michigan 48109,USA;

    Department of Materials Science and Engineering, Cornell University, Ithaca, New York 14853-1501, USA;

    State Key Laboratory of Silicon Materials, Zhejiang University, Hangzhou 310027, People's Republic of China;

    State Key Laboratory of Silicon Materials, Zhejiang University, Hangzhou 310027, People's Republic of China;

    State Key Laboratory of Silicon Materials, Zhejiang University, Hangzhou 310027, People's Republic of China;

    Department of Materials Science and Engineering, Cornell University, Ithaca, New York 14853-1501, USA;

    Department of Materials Science and Engineering, University of Michigan, Ann Arbor, Michigan 48109,USA;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号