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首页> 外文期刊>Journal of Applied Physics >Lattice dynamics and substrate-dependent transport properties of (In, Yb)-doped CoSb_3 skutterudite thin films
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Lattice dynamics and substrate-dependent transport properties of (In, Yb)-doped CoSb_3 skutterudite thin films

机译:(In,Yb)掺杂CoSb_3方钴矿薄膜的晶格动力学和基体依赖的传输性质

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摘要

Lattice dynamics, low-temperature electrical transport, and high-temperature thermoelectric properties of (In, Yb)-doped CoSb_3 thin films on different substrates are reported. Pulsed laser deposition under optimized conditions yielded single-phase polycrystalline skutterudite films. Raman spectroscopy studies suggested that In and Yb dopants occupy the cage sites in the skutterudite lattice. Low-temperature electrical transport studies revealed the n-type semiconducting nature of the films with extrinsic and intrinsic conduction mechanisms, in sharp contrast to the degenerate nature reported for identical bulk samples. Calculations yielded a direct bandgap close to 50 meV with no evidence of an indirect gap. The carrier concentration of the films was identical to that reported for the bulk and increased with temperature beyond 250 K. The higher resistivity exhibited is attributed to the enhanced grain boundary scattering in films with a high concentration of grains. The maximum power factor of ~0.68 W m~(-1) K~(-1) obtained at 660 K for the film on glass is found to be nearly four times smaller compared to that reported for the bulk. The observed difference in the power factors of the films on different substrates is explained on the basis of the diffusion of oxygen from the substrates and the formation of highly conducting CoSb_2 phase upon the oxidation of CoSb_3.
机译:报道了在不同基板上掺杂(In,Yb)的CoSb_3薄膜的晶格动力学,低温电输运和高温热电性能。在最佳条件下进行脉冲激光沉积可得到单相多晶方钴矿薄膜。拉曼光谱研究表明,In和Yb掺杂剂占据了方钴矿晶格中的笼形位点。低温电迁移研究表明,具有外在和本征传导机制的薄膜具有n型半导体性质,与相同散装样品的简并性质形成鲜明对比。计算得出接近50 meV的直接带隙,没有间接间隙的迹象。薄膜的载流子浓度与报道的载流子浓度相同,并随温度超过250 K而增加。所显示的较高电阻率归因于高晶粒度的薄膜中晶界散射增强。发现玻璃上的薄膜在660 K时获得的最大功率因数约为0.68 W m〜(-1)K〜(-1),几乎是所报道的最大功率因数的四倍。基于氧气从基板的扩散以及在CoSb_3氧化后形成高导电CoSb_2相的原因,解释了在不同基板上观察到的薄膜功率因数差异。

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  • 来源
    《Journal of Applied Physics》 |2011年第8期|p.083710.1-083710.7|共7页
  • 作者单位

    Materials Science and Engineering, King Abdullah University of Science and Technology, Thuwal 23955-6900, Saudi Arabia;

    Materials Science and Engineering, King Abdullah University of Science and Technology, Thuwal 23955-6900, Saudi Arabia;

    Materials Science and Engineering, King Abdullah University of Science and Technology, Thuwal 23955-6900, Saudi Arabia;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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